A 10cm silicon wafer with large visible patterns created using B-EUV lithography. This triggers chemical and physical changes in the resist which burns the patterns and circuity into the wafer. Currently, cutting-edge microchips are produced using ‘extreme ultraviolet lithography’ (EUVL) which can produce patterns smaller than 10nm. This mind-boggling nanometre scale is in the same realm as single antibodies (12nm) or transfer RNA molecules (7nm) within cells. Researchers have created a new method called ‘chemical liquid deposition’ (CLD) for depositing the ‘amorphous zeolitic imidazolate frameworks’ (aZIFs) from solution onto silicon wafers.