Adisyn (ASX: AI1) has achieved a major technical milestone in the development of its graphene semiconductor technology, scaling its low-temperature deposition process to a full 200-millimetre copper semiconductor wafer. The transition to a full 200mm semiconductor wafer represents a a substantial increase in the area coated in a single deposition run and a significant scale-up of Adisyn’s graphene deposition technology platform. Exceeded ExpectationsManaging director Arye Kohavi said the milestone was ahead of the company’s internal development expectations and demonstrated the rapid progress of its graphene semiconductor program. “Scaling a new materials technology from laboratory samples to a full 200mm semiconductor wafer presents significant technical challenges,” he said. Mr Kohavi believed a successful integration of the company’s process technology platform would create commercial opportunities through potential licencing, joint development, process or materials supply models.