Reuters has named Shanghai Aishengna Electronic Technology Group as the state-owned company producing China's first domestic immersion deep ultraviolet lithography (DUV) scanners, a day after news of the program broke without identifying the manufacturer. Xuzhou B&C says its ArF immersion products cover 45nm to 28nm and can stretch to 14nm, and chairman Fu Zhiwei has put mass production of China's core advanced resists five years out. A domestic immersion source is therefore worth having to CXMT, even at inferior overlay and throughput. As such, every exposure China adds to compensate for the missing EUV burns scanner hours a thin domestic fleet doesn't have. The AI Futures Project's June forecast puts a commercially viable domestic 7nm-capable immersion scanner between 2032 and 2038, with a median of 2035, and claims ASML holds 98.7% of the immersion market today.