The system will be installed at NTHU’s College of Semiconductor Research (CoSR) and used for academic research as well as joint development projects with Taiwan’s semiconductor industry. Unlike conventional lithography systems that rely on photomasks, the MBX platform enables researchers to directly write circuit patterns onto wafers. Why electron beam lithography matters Electron beam lithography has long been valued for its exceptional resolution, but conventional single-beam systems have generally been too slow for many high-throughput manufacturing applications. Multibeam’s approach uses multiple electron beams operating simultaneously, increasing throughput while maintaining the precision needed for advanced semiconductor fabrication. Supporting Taiwan’s semiconductor ecosystem NTHU described the new system as an important addition to its semiconductor research infrastructure.