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Samsung's Taylor, Texas fab could herald a breakthrough for the chipmaker, company plans 2026 risk production — new production flows, pellicles for EUV patterning as site targets 50,000 WSPM
['Anton Shilov', 'Contributing Writer', 'News Analysis', 'Social Links Navigation']
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It will also be the first fab to adopt pellicles for EUV patterning, something that drastically changes production flows.
As a result, Samsung's Taylor fab will likely be the company's largest logic production site that the company has ever operated.
Industry sources reportedly indicate that Samsung has ordered dedicated EUV pellicle attachment, detachment, and inspection systems for the Taylor fab.
The tools are said to support both conventional metal-silicide (MeSi) EUV pellicles and next-generation carbon nanotube pellicles, which gives Samsung an upgrade path.
For this reason, Samsung has so far avoided EUV pellicles because they were a net negative for its manufacturing economics and tool stability.