Unique single-module 3-axis precision motion platform. Ultra-low profile 3-axis nanopositioning stage is less than 40 mm tall. The A-361 XY-rotation stage combines an exceptionally low profile of just 39.5 mm with a generous 200 mm diameter motion platform. Its clean, non-contact design, combined with ultra-high stability and resolution, make it a compelling solution for semiconductor and photonics production environments. Industries ServedSemiconductor test and wafer inspection, photonics and fiber alignment, precision optics alignment, flat panel inspection, maskless lithography, advanced LED manufacturing, tribology, material research.